Infrared Lens Photolithography

Name: Infrared Lens Photolithography
Brand: Sichuan Yasi Optics Co.,Ltd.

We can process codes, phase gratings, projection gratings, reflective gratings, subdivisionplates, resolution plates and other products on the polished substrate surface of infraredmaterials according to customer requirements.

Products

Specifications of Infrared Lens Photolithography

Technical Requirement	Tolerance
Minimum line width	1.5um
Maximum area	1 80mm
Image tolerance	+0.5um (Based on photoetching area)
Depth	0.05um-10um (Based on width of image)
Depth tolerance	0.001 um
Substrate	Si, Ge, Znse, ZnS and othe infrared material ect
We can process codes, phase gratings, projection gratings, reflective gratings, subdivision plates, resolution plates and other products on the polished substrate surface of infrared materials according to customer requirements.

Features of Infrared Lens Photolithography

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High Precision: Enables precise patterning in infrared photolithography applications.

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Infrared Transparency: High transmittance in the infrared spectrum.

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Durable: Resistant to mechanical stress and environmental factors.

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Broad Spectral Range: Transmits from near-IR to far-IR wavelengths.

Advantages of Infrared Lens Photolithography

High Precision Patterning: Infrared lens photolithography offers precise patterning capabilities, crucial for manufacturing advanced infrared devices.
Infrared Transparency: High transmittance in the infrared spectrum enables accurate imaging and patterning.
Durable Construction: Resistant to mechanical stress and environmental factors, ensuring long-lasting performance.
Broad Spectral Range: Transmits wavelengths from near-IR to far-IR, suitable for diverse photolithography applications.

Contact Yasi for Optical Components

If you have any problems or suggestions about the optical componets, please contact Yasi, we will reply as soon as possible.